Miracle Wear Design for Enhanced Performance<\/h2>\n\n\n\n
Wear Design Program facilitates quick and easy dressing of previously worked image files or archived patterns and variants onto masked models. It simplifies seamless selection of fabric, model, pattern, and variants based on the obtained results.<\/strong><\/p>\n\n\n
\n<\/figure>\n<\/div>\n\n\n
\n
Facilitates easy selection of variants in a harmonious manner <\/li>\n\n\n\n
Provides natural and realistic dressing without losing texture properties <\/li>\n\n\n\n
Quickly and easily dresses masked models<\/li>\n<\/ul><\/div>\n\n\n\n
TECHNICAL SPECIFICATIONS<\/p>\n\n\n\n
\n
Dress your image files (.tiff, .jpeg, .png formats) onto pre-prepared masks without losing shadow, light, and texture properties, allowing you to obtain natural and realistic outputs in the desired designs.<\/li>\n\n\n\n
Dress files from your pattern archive in the Miracle Colorway variant software (.mif format) quickly and easily.<\/li>\n\n\n\n
Define fabric properties (satin, cotton, silk, nylon, etc.) on your masks to dress them realistically as desired.<\/li>\n\n\n\n
Rotate the dressed image file on the masks at any angle and intervene in shadow, fold, and stretch proportions in the width or length of the image file.<\/li>\n\n\n\n
Dress your masks with any color from previously cataloged, desired, or Pantone catalogs.<\/li>\n\n\n\n
Save your dressed masks, along with the preview and titles of the image files, in the designs you have created.<\/li>\n\n\n\n
Arrange the placement of your dressed masks in your outputs to achieve impressive presentations.<\/li>\n<\/ul><\/div>\n\n\n\n
![\"wear](\"https:\/\/www.ait.com.tr\/en\/wp-content\/uploads\/kanepe_kaydet-1024x650-1.jpg\")
<\/figure>\n<\/div>\n\n\n